Stage-by-stage formation of superficial nanostructures in ITO films reduced by H2-GD at low temperature (100 °C) for applications on plastic substrates

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AudienciaPúblico en generales_ES
CoberturaMéxicoes_ES
Fecha de ingreso2026-10-05T16:32:50Z
Fecha de publicación2020-01-01
ResumenThe formation of superficial nanostructures (SNs) in reduced indium tin oxide (ITO) thin films by H-2-Glow discharge (GD) at a low reduction temperature (T-r= 100 degrees C) was investigated. Sputtered ITO films deposited at low (T-d= 100 degrees C) and high (T-d= 300 degrees C) temperatures were reduced using this low-temperature process. Scanning electron and atomic force microscopy were applied to study the evolution of the nanostructural features and three stages were identified: emerging/densification, coalescence, and depletion stages. The structural characteristics of the SNs were characterized by grazing incidence and conventional /2 x-ray diffractions showing that at T-r= 100 degrees C, the reduction process was limited to the surface region in which the ion bombardment had influence. The mean diameter, , of the SNs in ITO deposited on the glass substrate was controlled from similar to 10-90 nm and the SN densities, d, were obtained from similar to 10(9)-10(11)SNs cm(-2). Finally, the superficial nanostructures were successfully formed in ITO films deposited on flexible polyethylene naphthalate (PEN) substrates. It was demonstrated that, on these substrates, is possible to obtain a uniform distribution in the size and density of the SNs, with = 9.5-20.7 nm and d = 2.66 x 10(11)-4.20 x 10(10)SNs cm(-2).es_ES
Doihttps://doi.org/10.1088/1361-6528/ab991ees_ES
URIhttps://riuat.uat.edu.mx/handle/123456789/4668
Idiomaenes_ES
EditorialIOP Publishing Ltdes_ES
RelaciónNanotechnologyes_ES
URL relacionadohttps://doi.org/10.1088/1361-6528/ab991ees_ES
DerechosAcceso restringido / Suscripción (Metadatos de producción científica)es_ES
Licenciahttp://purl.org/coar/access_right/c_16eces_ES
FuenteNanotechnology
Palabra clavesurfacees_ES
Palabra clavenanostructureses_ES
Palabra claveplasmaes_ES
Palabra clavelow-temperaturees_ES
Palabra claveplastic substratees_ES
TítuloStage-by-stage formation of superficial nanostructures in ITO films reduced by H2-GD at low temperature (100 °C) for applications on plastic substrateses_ES
TipoArtículoes_ES
ArbitradoHa sido Arbitradoes_ES
AutorCosme, I
AutorVazquez-Y-Parraguirre, S.
AutorMalik, O.
AutorCarlos, N.
AutorMansurova, S.
AutorBaldovino-Pantaleon, O.
AutorCosme, Ies_ES
AutorVazquez-Y-Parraguirre, S.es_ES
AutorMalik, O.es_ES
AutorCarlos, N.es_ES
AutorMansurova, S.es_ES
AutorBaldovino-Pantaleon, O.es_ES
InstituciónUniversidad Autónoma de Tamaulipas
InstituciónUniversidad Autónoma de Tamaulipases_ES
Número37es_ES
URL relacionadahttps://doi.org/10.1088/1361-6528/ab991e
Tipo de artículoIndexado
Tipo de artículoIndexadoes_ES
Volumen31es_ES

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