Influence of Deposition Parameters on Structural and Electrochemical Properties of Ti/Ti2N Films Deposited by RF-Magnetron Sputtering

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AudienciaPúblico en generales_ES
CoberturaMéxicoes_ES
Fecha de ingreso2026-09-15T00:30:03Z
Fecha de publicación2022-01-01
ResumenThe titanium nitride (Ti2N) films have good mechanical properties, such as high hardness and chemical stability, giving Ti2N good resistance to wear and corrosion. The properties of films deposited by PVD techniques are determined by their structure, microstructure, composition, and morphology that depend on the deposition parameters, such as substrate temperature, vacuum pressure, and the distance between the target and the substrate. The influence of these parameters has been studied individually. This work studied the structure, morphology, composition, and electrochemical behavior of Ti/Ti2N films deposited by RF-magnetron sputtering on carbon steel, such as a function of the power of the RF source, substrate temperature, and the target to substrate distance and the Ar/N2 ratio. The film structure was analyzed by X-ray diffraction (XRD), the morphology of cross-section by SEM, the semi-quantitative composition by EDS, and the electrochemical properties was studied by open circuit potential, potentiodynamic polarization, and electrochemical impedance spectroscopy techniques. The films showed two phases of Ti and Ti2N. The SEM-EDS exhibited a morphology according to the Stranski–Krastanov or layer-plus-island growth model. The substrate temperature of 450 °C strongly influences the electrochemical properties.es_ES
Doihttps://doi.org/10.3390/met12081237es_ES
URIhttps://riuat.uat.edu.mx/handle/123456789/2004
Idiomaeses_ES
EditorialMDPI AGes_ES
RelaciónMetalses_ES
URL relacionadohttps://doi.org/10.3390/met12081237es_ES
DerechosAcceso abierto (Metadatos de producción científica)es_ES
Licenciahttp://purl.org/coar/access_right/c_abf2es_ES
FuenteMetals
TítuloInfluence of Deposition Parameters on Structural and Electrochemical Properties of Ti/Ti2N Films Deposited by RF-Magnetron Sputteringes_ES
TipoArtículoes_ES
ArbitradoHa sido Arbitradoes_ES
AutorGonzález-Hernández, Andrés
AutorAperador, William
AutorFlores, Martín
AutorOnofre-Bustamante, Edgar
AutorBermea, Juan E.
AutorBautista-García, Roberto
AutorGamboa-Soto, Federico
AutorGonzález-Hernández, Andréses_ES
AutorAperador, Williames_ES
AutorFlores, Martínes_ES
AutorOnofre-Bustamante, Edgares_ES
AutorBermea, Juan E.es_ES
AutorBautista-García, Robertoes_ES
AutorGamboa-Soto, Federicoes_ES
InstituciónUniversidad Autónoma de Tamaulipas
InstituciónUniversidad Autónoma de Tamaulipases_ES
Número8es_ES
Rango de páginas1237es_ES
URL relacionadahttps://doi.org/10.3390/met12081237
Tipo de artículoIndexado
Tipo de artículoIndexadoes_ES
Volumen12es_ES

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