Optimizing Ni-N Thin Films: Effects of r.f. Power on Mechanical and Electrochemical Performance

Abstract

Corrosion of carbon steel components represents a major economic and safety challenge in industrial applications, motivating the development of protective thin film coatings with optimized deposition parameters. This study investigates the deposition of nickel nitride (Ni-N) thin films on AISI 1016 carbon steel and silicon (111) wafers by reactive radio-frequency (r.f.) magnetron sputtering at three power levels: 150, 175, and 200 W. Surface color, film thickness, roughness, crystal structure, mechanical properties, and electrochemical behavior were evaluated using optical microscopy, stylus profilometry, atomic force microscopy (AFM), X-ray diffraction (XRD), nanoindentation, and potentiodynamic polarization combined with electrochemical impedance spectroscopy (EIS). Increasing r.f.-power produced systematic surface color changes consistent with variations in film thickness, which ranged from approximately 25.0 to 50.7 nm. Higher deposition power promoted smoother surfaces, with average roughness (Ra) decreasing from 64.28 nm at 150 W to 20.62 nm at 200 W. XRD analysis revealed a monocrystalline Ni3N hexagonal close-packed (HCP) phase at 150 W, transitioning to a dual-phase Ni3N (HCP) and Ni4N face-centered cubic (FCC) microstructure at 175 and 200 W. The highest hardness (11.80 ± 3.34 GPa) was recorded at 150 W, accompanied by pop-in events attributed to dislocation nucleation in the HCP lattice. Electrochemical evaluation in 3.5 wt.% NaCl solution demonstrated that films deposited at 150 and 175 W exhibited corrosion current densities and rates exceeding those of bare steel, confirming that these conditions accelerate rather than inhibit corrosion. Only the film deposited at 200 W achieved superior corrosion protection, with a corrosion current density and rate approximately 50% lower than bare steel, attributed to its denser microstructure and smoother surface morphology. These findings demonstrate that r.f. power is a critical parameter governing the properties of Ni-N thin films, and that careful optimization of deposition conditions is essential before recommending such coatings for industrial corrosion-protective applications.